Fundamentals, methods & diagnostics of Pulsed deposition processes I

10:00 AM • 2408 • Temporally modulated vapor fluxes: a tool for controlling morphology and atomic arrangement in thin films > K. Kostas SARAKINOS (Helsinki) 10:30 AM • 2139 • Steps for decoupling the effects of the kinetic and potential energy of ions for pulsed filtered cathodic arc deposited (V,Al)N thin films > Y. Yeliz UNUTULMAZSOY (Leipzig) 10:45 AM • 2481 • New High Power Impulse Magnetron Sputtering (e-HiPIMS) with a multi-level high power supply > J. Joelle ZGHEIB (Nantes) 11:00 AM • 33_949 • Effect of annealing temperature on optical and microstructural properties of Cu-based transparent heat reflectors obtained by HiPIMS and RFMS processes > I. Iulian PANA (Magurele) 11:15 AM • 730 • Pulsed Laser Deposited Nanostructured Manganese Oxides Thin Films: Decoupling Morphology and Phase for a Rationally Designed Material > A. Andrea MACRELLI (Milano) 11:30 AM • 2560 • Deposition inside silicon trenches and porous substrate using bipolar high power impulse magnetron sputtering > S. Soumya ATMANE (Orleans) 11:45 AM • 1614 • Synthesis of functional crystalline oxides by digitally processed DC sputtering synchronized with oxygen gas pulsing > H. Hideo ISSHIKI (Tokyo)