Simulation and Modeling III
Wednesday, May 31, 2023
M - Materials engineering for advanced semiconductor devices
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M10
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1:30 PM
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3:00 PM
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Simulation and Modeling III
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Schuman (1st floor)
M - Materials engineering for advanced semiconductor devices
1:30 PM
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2698
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Material Engineering for Advanced CMOS Technology
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V.
Victor
MOROZ (Mountain View)
2:00 PM
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2325
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Gate-All-Around SRAM: Performance Investigation and Optimization Towards Vccmin Scaling
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P.
Pratik B
VYAS (Santa Clara)
2:15 PM
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2002
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Impact of solid and liquid phase reflectivity on the ultra-fast laser melting of silicon-germanium alloys
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D.
Damiano
RICCIARELLI (Catania)
2:30 PM
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2074
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Boron diffusion in germanium and the impact of oxygen
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F.
Felix
KIPKE (Münster)
2:45 PM
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623
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Generation and loss of hydrogen-boron pairs in fired silicon wafers
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V.
Vladimir
VORONKOV (Merano)
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