Poster session 1
Tuesday, May 30, 2023
M - Materials engineering for advanced semiconductor devices
•
M_P01
•
4:30 PM
>
6:30 PM
•
Poster session 1
•
Etoile (1st floor)-M
M - Materials engineering for advanced semiconductor devices
•
01_40
•
01_40-Defects visualization in Gallium Nitride by Scanning Transmission Electron Microscopy
>
C.
Corrado
BONGIORNO (Catania)
•
02_148
•
02_148-Investigation of carrier Lifetime variation with nanopillar spacing in Si-nanopillar/SiGe composite materials for MOSFET application by laser heterodyne photothermal displacement measurements
>
T.
Tomoki
HARADA (Miyazaki)
•
03_300
•
03_300-Deep Level Transient Spectroscopy-Secondary Ion Mass Spectrometry combined study of H+ irradiation effects on 4H-SiC
>
M.
Melissa Lucia
SCALISI (Catania)
•
05_778
•
05_778-Super-Resolution Fluorescence Imaging for Semiconductor Nanoscale Metrology and Inspection
>
S.
Seohyun
MUN (Seoul)
•
06_811
•
06_811-Band Bending and Surface Composition Analysis by Angle Resolved XPS and Their Impact on Minority Carrier Lifetime After Germanium Wet Etching
>
A.
Alexandre
CHAPOTOT (Sherbrooke)
•
07_930
•
07_930-Manipulating spin texture in a hybrid nanostructure comprised of topological insulator and 2D semiconductor with varied band alignment types
>
C-M.
Cheng-Maw
CHENG (Hsinchu City)
•
08_950
•
08_950-Thermal transport on few-layers Fe3GeTe2
>
M.
Marcel S.
CLARO (Santiago De Compostela)
•
09_1102
•
Stress/strain-induced Raman frequency shift in Gallium Nitride (GaN) Packaged Devices
>
Z.
Zainab
DAHROUCH (Messina)
•
10_1471
•
Features of Ultrathin SiO2 Layers on Si and Their Physical Manifestations
>
K.
Konstantin
KONIN (Kyiv)
•
11_1472
•
11_1472-4H-SiC RIE etch: Design of Experiments optimization for striations recovery by using ImageJ software
>
M.
Matteo
BARCELLONA (Catania)
•
12_2639
•
12_2639-Sub-Picosecond Carrier Dynamics Explored using Automated High-Throughput Studies of Doping Inhomogeneity within a Bayesian Framework
>
R.
Ruqaiya
AL-ABRI (Manchester)
•
13_355
•
13_355-Radiation-enhanced annealing of vacancy-oxygen defects in Cz n-Si: features of the experiment, factor of the radiation ionization, and a possible annealing mechanism
>
M.
Mykola
KRAS’KO (Kyiv)
•
14_518
•
14_518-New states of ??2 defect in boron-doped Si
>
L.
Lyudmila
KHIRUNENKO (Kyiv)
•
15_627
•
15_627-The Diffusion Behavior and Electrical Characteristics of Ru Interconnect with Polycrystalline MoS2 Diffusion Barrier
>
D.
Dun Jie
JHAN (Hsinchu, Taiwan (R.O.C.))
•
16_2411
•
16_2411-Density functional theory study of multi-interstitial defects complexes in germanium
>
A.
Abdulgaffar
ABDURRAZAQ (Toulouse)
•
17_2001
•
17_2001-Gibbs free energy for MoO2Cl2 reaction on SiO2 surface by density function theory
>
H-K.
Hyun-Kyu
KIM (Cheonan)
•
18_2043
•
18_2043-Two-dimensional carrier gas at a polar interface without surface band gap states: A first principles perspective
>
F.
Federico
BRIVIO (Rehovot)
•
19_2095
•
19_2095-Two-dimensional van der Waals heterostructures for energy-efficient tunneling transistors
>
K.
Konstantina
IORDANIDOU (Göteborg)
•
20_69
•
20_69-General Purpose Machine Learning Interatomic Potential for Silicon-Germanium
>
D.
Diego
MILARDOVICH (Vienna)
•
21_2050
•
21_2050-Ab-initio study of the effects of Pb intercalation in Graphene/SiC heterostructures
>
S.
Simone
BROZZESI (Roma)
•
22_1380
•
22_1380-Tuning the Schottky Contacts of graphene/phosphorene heterostructure: a DFT study
>
A.
Alessia
MURONI (Roma)
•
23_893
•
23_893-TCAD modelling of a-Si:H devices for particle detection applications
>
D.
Daniele
PASSERI (Perugia)
•
24_1206
•
24_1206-Post growth thermal treatments of Si1-x-yGexSny alloys
>
O.
Oliver
STEUER (Dresden)
•
25_43
•
25_43-New method for the deposition of thin films on the inner walls of a deep cavity: application to germanium doping
>
C.
Chiara
CARRARO (Legnaro)
•
26_1476
•
26_1476-Strained sintered mesoporous silicon epifoils for IIIV/Si integration and substrate reuse
>
C.
Clara
SANCHEZ-PEREZ (Madrid)
•
28_827
•
28_827-Impact of annealing schemes on the formation and agglomeration of thin Ni(Pt)Si film for advanced 3D imagers technologies
>
F.
Fabriziofranco
MORRIS ANAK (Grenoble)
•
29_2081
•
29_2081-In-situ transmission electron microscope observation of nickel metal-induced crystallization on a-Si
>
C-C.
Chen-Chih
HSIANG (Taipei)
•
30_2202
•
30_2202-Study of interfaces in nickel-based silicides through a multi-level modeling strategy
>
C.
Cesar
JARA (Toulouse)
•
31_189
•
31_189-Influence of the type of interlayer on current transport mechanisms and defects in n-ZnO/ZnCdO/p-Si and n-ZnCdO/ZnO/p-Si heterojunctions grown by molecular beam epitaxy
>
R.
Radoslaw
SZYMON (Wrocław)
•
32_1572
•
32_1572-Phase transition control of crystalline Ga2O3 grown on sapphire (0001) by MOCVD
>
H-Y.
Hyeong-Yun
KIM (Jinju)
•
33_1915
•
33_1915-Deposition of Ga2O3 and ZnGa2O4 thin films by liquid metal target sputtering
>
M.
Martins
ZUBKINS (Riga)
•
35_805
•
35_805-Wafer-Scale Production of 2D SnSe: Synthetic Platform for Van der Waals Semiconductor-Based Broadband Photodetectors
>
H-K.
Hyeong-Ku
JO (Daejeon)
•
36_605
•
36_605-Formation of High-k Al-doped ZrO2 Dielectric Using a New Cocktail Precursor
>
H.
Hayeong
KIM (Daejeon)
•
37_1030
•
37_1030-Effect of dopant distribution on the remanent polarization of La-doped HfO2 thin films
>
J.
Ju Young
JEONG (Seoul)
•
38_1019
•
38_1019-Ferroelectricity of La doped Hf0.5Zr0.5O2 Films Deposited by Atomic Layer Deposition using Supercycles
>
Y.
Yoogeun
HAN (Seodaemun-Gu)
•
39_1647
•
39_1647-Oxygen Vacancy Control-mediated Ferroelectricity Enhancement in Hafnium Zirconium Oxide Via DUV Photoactivation
>
S.
Sangwoo
LEE (Gwangju)
•
40_458
•
40_458-Chemical design of magnetoelectric GaFeO3 epitaxial thin films
>
M.
Mircea
NASUI (Cluj-Napoca)
•
41_861
•
41_861-Engineering Transition Metal Oxide and Transition Metal Dichalcogenide Memristive Devices for Neuromorphic Systems
>
A.
Anna
LINKENHEIL (Ilmenau)
•
42_113
•
42_113-Mist-CVD Deposited c-Axis Aligned Crystalline ITZO Thin Film and Its Application to Thin-Film Transistor
>
H-Y.
Han-Yin
LIU (Kaohsiung)
•
43_1238
•
43_1238-A comprehensive study of the influence of various deposition parameters on the physical properties of ZnO:Al thin transparent conducting films
>
A.
Adel Sarolta
RACZ (Budapest)
•
44_1103
•
44_1103-High mobility Oxide Thin Film Transistor with amorphous In-Ga-Sn-O fabricated by RF-magnetron sputtering
>
J.
Jo
HYUNIL (Korea)
•
45_1125
•
45_1125-Growth Control, Optical and Structural Characterization of Layered Gallium Sulfide Films Prepared by Chemical Vapor Deposition
>
S.
Stefano
DICORATO (Bari)
•
46_1992
•
46_1992-Growth of MoSe2-MoS2 core-shell in-plane heterostructure TMDs using Chemical Vapor Deposition
>
I.
Insu
LIM (Seoul)
•
48_1827
•
48_1827-Photothermal reaction based Low Temperature Synthesis of Vertically Integrated Two-dimensional Heterostructure
>
M-J.
Min-Ji
JEON (Busan)
•
47_2454
•
47_2454-Phase Change Sb2S3 films grown by Chemical Vapor Deposition
>
M.
Maria Michela
GIANGREGORIO (Bari)
•
49_625
•
49_625-Manifestation of Eu dopants in Raman spectra and doping concentration profiles of {ZnCdO/ZnO} superlattices
>
I.
Igor
PERLIKOWSKI (Wroclaw)
•
50_1441
•
50_1441-Effect of gallium doping on structural and transport properties of the Topological Insulator Bi2Se3 by molecular beam epitaxy
>
A.
Ana
PÉREZ RODRÍGUEZ (Salamanca)
•
51_100
•
51_100-Extraction of single-walled carbon nanotubes of defined chirality with conjugated polymers in organic solvents
>
D.
Dawid
JANAS (Gliwice)
|