Simulation and Modeling II
Tuesday, May 30, 2023
M - Materials engineering for advanced semiconductor devices
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M06
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10:00 AM
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12:00 PM
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Simulation and Modeling II
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Schuman (1st floor)
M - Materials engineering for advanced semiconductor devices
10:00 AM
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2737
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Machine-learning-assisted determination of the global zero-temperature phase diagram of materials
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M.
Miguel A. L.
MARQUES (Bochum)
10:30 AM
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1196
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Ground and excited state properties of meta-stable allotropic forms of 2D Tellurium from first principles approaches
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S.
Simone
GRILLO (Rome)
10:45 AM
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574
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Charged intrinsic defect states in amorphous Si3N4
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C.
Christoph
WILHELMER (Vienna)
11:00 AM
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710
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Multiscale modeling of ultrafast transformations and structural disorder in laser annealed SiGe nanostructures
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G.
Gaetano
CALOGERO (Catania)
11:15 AM
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858
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Functionality of polycrystalline-Si channel: insight from first-principles and multi-scale modeling
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R.
Rita
MAJI (Reggio Emilia)
11:30 AM
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1769
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A Multiscale Modeling Approach for Revealing Defects Relevant in Charge Trapping Related Phenomena
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D.
Dominic
WALDHOER (Vienna)
11:45 AM
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2065
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Kinetic Monte Carlo simulations of heated boron implantation and non-melt laser annealing in Si and SiGe layers
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S.
Simon
MUNDINAR (Erlangen)
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