Simulation and Modeling II

Tuesday, May 30, 2023
M - Materials engineering for advanced semiconductor devices M06 10:00 AM > 12:00 PM Simulation and Modeling II Schuman (1st floor) M - Materials engineering for advanced semiconductor devices

10:00 AM 2737 Machine-learning-assisted determination of the global zero-temperature phase diagram of materials > M. Miguel A. L. MARQUES (Bochum) 10:30 AM 1196 Ground and excited state properties of meta-stable allotropic forms of 2D Tellurium from first principles approaches > S. Simone GRILLO (Rome) 10:45 AM 574 Charged intrinsic defect states in amorphous Si3N4 > C. Christoph WILHELMER (Vienna) 11:00 AM 710 Multiscale modeling of ultrafast transformations and structural disorder in laser annealed SiGe nanostructures > G. Gaetano CALOGERO (Catania) 11:15 AM 858 Functionality of polycrystalline-Si channel: insight from first-principles and multi-scale modeling > R. Rita MAJI (Reggio Emilia) 11:30 AM 1769 A Multiscale Modeling Approach for Revealing Defects Relevant in Charge Trapping Related Phenomena > D. Dominic WALDHOER (Vienna) 11:45 AM 2065 Kinetic Monte Carlo simulations of heated boron implantation and non-melt laser annealing in Si and SiGe layers > S. Simon MUNDINAR (Erlangen)

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