Integration Challenges

Monday, May 29, 2023
M - Materials engineering for advanced semiconductor devices M01 8:45 AM > 10:00 AM Integration Challenges Schuman (1st floor) M - Materials engineering for advanced semiconductor devices

8:45 AM 2740 Recent advances in 3D sequential integration > L. Laurent BRUNET (Grenoble) 9:15 AM 958 Reconfigurable Field-Effect Transistor Technology via Heterogeneous Integration of SiGe with Crystalline Al Contacts > L. Lukas WIND (Vienna) 9:30 AM 1411 Engineering of HZO layer for the fabrication of ultimate 3D vertical transistors for Memory-in-Logic applications > K. Konstantinos MOUSTAKAS (Toulouse) 9:45 AM 817 Isotopically Enriched 28Si Substrates for Quantum Computers Produced Using Ion Implantation Layer Exchange > J. Jonathan ENGLAND (Horsham)

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